Browse Prior Art Database

Making Metalized Photographic Masks

IP.com Disclosure Number: IPCOM000094592D
Original Publication Date: 1965-Mar-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Langdon, JL: AUTHOR

Abstract

In the mask technology employed in the formation of printed circuits and the like, a plurality of images of a particular circuit can be created at one time in the photographic emulsion. Where the developed emulsion is then used many times for circuit production, it can become readily scratched.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Making Metalized Photographic Masks

In the mask technology employed in the formation of printed circuits and the like, a plurality of images of a particular circuit can be created at one time in the photographic emulsion. Where the developed emulsion is then used many times for circuit production, it can become readily scratched.

A photographic mask which is less vulnerably to scratches is formed by depositing a thin film of a metal such as aluminum or chromium on a glass plate. The metalized plate is coated with a photoresist material. The plate is exposed to the multicircuit pattern as by a fly's eye camera with ultraviolet light being employed. The photoresist pattern is developed and fixed. Finally, the undesired metal is etched away from the plate. The resultant mask can then be used in place of the photographic emulsion of the usual processes.

1