Browse Prior Art Database

Control of Evaporant in Vacuum from Output of Laser

IP.com Disclosure Number: IPCOM000094902D
Original Publication Date: 1965-Jul-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Potts, HR: AUTHOR [+2]

Abstract

Monitoring the ionized current during a vapor deposition process can be utilized for calibrating the thickness of deposited films. The output energy of a laser is passed through a lens system situated outside of a vacuum chamber within which the deposition process is carried out. The energy of the focussed laser beam is directed to an evaporant constituting a thin film. A collector element is disposed in the vapor stream issuing from the evaporated film. A current measuring device, having appropriate calibration, is connected to the collector and is utilized to read the ionic current to control the deposition process.

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Control of Evaporant in Vacuum from Output of Laser

Monitoring the ionized current during a vapor deposition process can be utilized for calibrating the thickness of deposited films. The output energy of a laser is passed through a lens system situated outside of a vacuum chamber within which the deposition process is carried out. The energy of the focussed laser beam is directed to an evaporant constituting a thin film. A collector element is disposed in the vapor stream issuing from the evaporated film. A current measuring device, having appropriate calibration, is connected to the collector and is utilized to read the ionic current to control the deposition process.

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