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Laser Induced Evaporation

IP.com Disclosure Number: IPCOM000094947D
Original Publication Date: 1965-Jul-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 23K

Publishing Venue

IBM

Related People

Potts, HR: AUTHOR [+2]

Abstract

Under controlled environmental conditions, the energy of a laser beam can be utilized to produce deposited films of controlled thickness. Such is from materials heretofore considered unsuitable for deposition techniques. The energy from a laser source, located externally of the vacuum chamber, is focussed on a thin-film evaporant. This is suitably disposed within the vacuum chamber and in proximity to the substrate upon which the vaporized evaporant is to be deposited. This process enables depositing films from evaporants, such as tungsten, ceramics and the like, where precise environmental conditions must be maintained.

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Laser Induced Evaporation

Under controlled environmental conditions, the energy of a laser beam can be utilized to produce deposited films of controlled thickness. Such is from materials heretofore considered unsuitable for deposition techniques. The energy from a laser source, located externally of the vacuum chamber, is focussed on a thin-film evaporant. This is suitably disposed within the vacuum chamber and in proximity to the substrate upon which the vaporized evaporant is to be deposited. This process enables depositing films from evaporants, such as tungsten, ceramics and the like, where precise environmental conditions must be maintained.

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