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Control of Skew in Large Magnetic Film Planes

IP.com Disclosure Number: IPCOM000095046D
Original Publication Date: 1965-Aug-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Beam, WR: AUTHOR

Abstract

Distortion of the easy axis in the formation of a large magnetic film memory plane is prevented.

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This is the abbreviated version, containing approximately 85% of the total text.

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Control of Skew in Large Magnetic Film Planes

Distortion of the easy axis in the formation of a large magnetic film memory plane is prevented.

When a magnetic film is deposited upon a substrate under condition, supposed to produce uniformly oriented easy axes in all film parts, in many cases the easy axes in some film parts are skewed with respect to the desired orientation. Such distortions can be caused by variations in the incidence angle of arriving vapor or by anisotropic strains developed in the substrate during or after the deposition process. If there can be anticipation with a fair degree of accuracy of the particular skew pattern that these influences tend to produce, it should be possible to establish a selective anti skew pattern of counteracting influences.

In accordance with this method, a pattern of counteracting anisotropic stresses is set up in the substrate. Such is effected by nonuniform heating or by nonuniform mechanical stressing of the substrate, or by some combination of these effects, during the deposition of the film on the substrate. The thermal method can be carried out by several techniques. These are such as either selectively coating the reverse face of the substrate according to a preselected pattern or using a special heater for obtaining a desired substrate temperature profile. The mechanical method involves designing the substrate holder to apply selected stresses, particularly near the center of the substrate, to offset the nor...