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Apparatus for the Introduction of Substrates into a Vapor Deposition System

IP.com Disclosure Number: IPCOM000095193D
Original Publication Date: 1965-Oct-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Silvestri, VJ: AUTHOR

Abstract

The apparatus introduces substrates into a vapor deposition system. Loading of multiple substrates is permitted. Shutdown of the system during loading is eliminated. Purging of the loading region prior to deposition is permitted. Preheating of the substrates to eliminate undesirable condensation prior to deposition is effected. Continuous loading of substrates is possible without changing temperature or flow conditions. Deposition cannot take place until the positive introduction of a substrate into a deposition region.

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Apparatus for the Introduction of Substrates into a Vapor Deposition System

The apparatus introduces substrates into a vapor deposition system. Loading of multiple substrates is permitted. Shutdown of the system during loading is eliminated. Purging of the loading region prior to deposition is permitted. Preheating of the substrates to eliminate undesirable condensation prior to deposition is effected. Continuous loading of substrates is possible without changing temperature or flow conditions. Deposition cannot take place until the positive introduction of a substrate into a deposition region.

The apparatus has enclosed deposition zone 1 and preheat zone 2. Modified Beckman fitting 3 seals the open end of quartz tube 4 and provides an entry passage for purge tube 5 and seed rod 6. A seed of gallium arsenide 7, for instance, is shown disposed within depression 8 in rod 6. The latter is held coaxially in tube 5 by another modified Beckman fitting 9 and can be translated independently of tube 5. This contains aperture 10 through which deposition occurs when seed 7 is placed in registry with aperture 10 during deposition in zone 1. This arrangement is shown by the dotted-line portions of tube 5 and rod
6.

Prior to positioning seed 7 in zone 1 and after deposition is accomplished by introduction of deposition products at 1 1, tube 5 is positioned so that aperture 10 is sealed by a portion of TEFLON* bushing 12 of fitting 3. In this manner, purging of the tube can be...