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Quantitative Analysis of Hypophosphite Anion in Electroless Deposition Baths

IP.com Disclosure Number: IPCOM000095195D
Original Publication Date: 1965-Oct-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 3 page(s) / 37K

Publishing Venue

IBM

Related People

Geist, T: AUTHOR [+3]

Abstract

Control of electroless deposition baths depends to a great extent upon maintaining a knowledge of the concentration of the various bath constituents.

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Quantitative Analysis of Hypophosphite Anion in Electroless Deposition Baths

Control of electroless deposition baths depends to a great extent upon maintaining a knowledge of the concentration of the various bath constituents.

The analysis and control of hypophosphite anion in electroless deposition baths is important if the product is to be uniform and useful. This is especially true for those baths depositing ferromagnetic material. In preparing magnetic recording material, hypophosphite anion concentration variation can be critical in its effect on plating rate, phosphorous content of the plated material, particle size, coercive force, output and dynamic range. It can be especially critical in the area of wear as small variations in phosphorous content can significantly affect the structure of the deposit. Similarly, a small variation of phosphorous content can significantly change the coercive force and rise time of a plated memory element. It is thus important to determine and control the hypophosphite anion concentration in magnetic material plating baths.

A scheme for automatic analysis of hypophosphite anion, utilizing a TECHNICON AUTO ANALYZER* is schematically shown. The analysis is typical of that which is utilized in determining the content of a bath used to prepare magnetic recording media or a magnetic memory element. *Trademark of Technicon Instruments Corp.

A standard bath utilized for comparison purposes in the analysis of a recording media bath is as follows....