Browse Prior Art Database

High Intensity Illuminator

IP.com Disclosure Number: IPCOM000095803D
Original Publication Date: 1964-Jul-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

Hayes, LP: AUTHOR [+2]

Abstract

This illuminating system achieves a sufficiently high intensity to illuminate several reticles at one time so that several patterns can be traced using a single projection lens. The system is used to expose photoresist directly in a printed circuit generator or tracer such as shown in Vol. 4, No. 7, Dec. 1961, p. 11, of the IBM Technical Disclosure Bulletin.

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High Intensity Illuminator

This illuminating system achieves a sufficiently high intensity to illuminate several reticles at one time so that several patterns can be traced using a single projection lens. The system is used to expose photoresist directly in a printed circuit generator or tracer such as shown in Vol. 4, No. 7, Dec. 1961, p. 11, of the IBM Technical Disclosure Bulletin.

Water jacket 1 contains mercury arc lamp 2 and has a cylindrical condenser lens 3 in one wall. The axis of lens 3 is parallel to that of lamp 2 and creates a line image of the source at the entrance pupil of projection lens 4. Reticle patterns 5 on carrier 6 are imaged at 7 with a high brightness.

In this arrangement, a system with cylindrical symmetry at right angles to the optical axis is combined with a system with spherical symmetry about the optical axis to produce 85% of the brightness in the image plane that can be obtained by a system with a source of equal brightness. The entire reticle field is evenly illuminated allowing for a large selection of reticle patterns within this field. The condenser and source system is light and small and provides a heat sink for the high power lamp.

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