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Removing Impurities from Surfaces

IP.com Disclosure Number: IPCOM000095831D
Original Publication Date: 1964-Aug-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Young, DR: AUTHOR [+2]

Abstract

The cleaning or removing of surface impurities from insulators such as glass is accomplished by a suitable radiation of the surface of the insulator to ionize the surface impurities in conjunction with the application of an electric field to sweep the impurity ions off that surface. To increase the mobility of the impurities and thus promote their removal, the insulator can also be maintained at an elevated temperature.

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Removing Impurities from Surfaces

The cleaning or removing of surface impurities from insulators such as glass is accomplished by a suitable radiation of the surface of the insulator to ionize the surface impurities in conjunction with the application of an electric field to sweep the impurity ions off that surface. To increase the mobility of the impurities and thus promote their removal, the insulator can also be maintained at an elevated temperature.

To remove surface impurities from a semiconductor device, that surface is bombarded with radiation to ionize the impurities on it. An electric field, created as by reversely biasing a diode portion of the device, is employed to sweep the impurities from the critical surface areas of the device. An elevated temperature can also be employed to increase the mobility of surface impurities to assist in their removal.

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