Browse Prior Art Database

Membrane Valve,

IP.com Disclosure Number: IPCOM000096099D
Original Publication Date: 1964-Dec-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Hellbardt, G: AUTHOR [+2]

Abstract

The valve is used in systems for chemically polishing, epitaxially growing, and doping semiconductor components by gas transport. Such systems employ partly highly aggressive gases, partly gases of extreme purity, but also gas mixtures having both of these properties. This results in the danger that minimum leaks may cause grave disturbances or that particles released due to minimum damages to the control elements of the valve may poison the gas stream.

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Membrane Valve,

The valve is used in systems for chemically polishing, epitaxially growing, and doping semiconductor components by gas transport. Such systems employ partly highly aggressive gases, partly gases of extreme purity, but also gas mixtures having both of these properties. This results in the danger that minimum leaks may cause grave disturbances or that particles released due to minimum damages to the control elements of the valve may poison the gas stream.

In order to avoid this danger, membrane 1 consists of an elastic hollow body which is filled with a pressurized protective gas or is constantly maintained under a predetermined pressure via conduit 2. The valve is controlled by magnet coil 3 and magnet core 4 which for avoiding any contact with the gas growing in the direction of the arrows 5 is entirely enclosed in plastic envelope 6. Suitable materials for the membrane and the core envelope are either nylon or other mechanically and chemically extremely resistant plastic materials.

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