Browse Prior Art Database

Crossover Insulation

IP.com Disclosure Number: IPCOM000096153D
Original Publication Date: 1963-Jan-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Maissel, LI: AUTHOR [+2]

Abstract

A photosensitive etch resist KMER*, manufactured by Eastman Kodak, is utilized for the insulating material separating crossed conductors in thin film circuits.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Crossover Insulation

A photosensitive etch resist KMER*, manufactured by Eastman Kodak, is utilized for the insulating material separating crossed conductors in thin film circuits.

To insulate with the etch resist, the entire surface of the conductor is first coated. The coated conductor is then placed on a table and rotated to remove the excess of the etch resist. Following this, the resist is dried, baked at 120 degrees C. It is then exposed to high-intensity illumination from a carbon arc or mercury-vapor lamp in those areas where the insulation is desired. The resist is next developed in petroleum ether or with a mixture of xylene and kerosene. The areas which were not exposed to illumination are now easily removed, leaving insulation on those areas where other conductors are to cross over.

1