Browse Prior Art Database

Work Holder and Alignment Device

IP.com Disclosure Number: IPCOM000096210D
Original Publication Date: 1963-Feb-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 100K

Publishing Venue

IBM

Related People

Langdon, JL: AUTHOR [+2]

Abstract

This dual function device accurately aligns photographic mask 1 relative to unexposed photosensitive wafer 2. The device also establishes direct physical contact between aligned wafer 2 and mask 1 and maintenance of same during the exposing operation.

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Work Holder and Alignment Device

This dual function device accurately aligns photographic mask 1 relative to unexposed photosensitive wafer 2. The device also establishes direct physical contact between aligned wafer 2 and mask 1 and maintenance of same during the exposing operation.

A uniball joint arrangement 3 actuated by joystick 4 imparts a transverse positioning motion, through mating element 5 and support 6, to mask 1. Mask 1 which is seated on 0-rings 7 is held in place by the evacuation of cavity 8. Angular positioning of mask 1 is made possible by handle 9 fixed to support 6, which when rotated, imparts angular positioning motion.

Once wafer 2, which is also held in place by suction, is properly aligned with respect to mask 1, the two elements are brought into direct physical engagement. This step is accomplished by turning thumbnut 10, advancing poppet 11 which is biased in the upward direction by a pressure differential created across radially extending portions 12.

Thus, with this device, transverse, angular, and vertical positioning adjustments of a mask relative to a wafer are possible by merely actuating the joystick, handle, and thumbnut, respectively.

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