Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Heat Insulation Coating for a Compound Mask

IP.com Disclosure Number: IPCOM000096324D
Original Publication Date: 1963-Apr-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Kahan, GJ: AUTHOR

Abstract

A substrate 2 is covered with KMPR 3, a material manufactured by Eastman Kodak, so that light hitting such material makes the exposed portions wash away by a subsequent chemical bath, but leaves the unexposed material in a hardened state. Such substrate 2 can be a coarse mask. Ultraviolet light is shown upon the rear portion of the coarse mask so that light penetrates the openings in the coarse mask.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Heat Insulation Coating for a Compound Mask

A substrate 2 is covered with KMPR 3, a material manufactured by Eastman Kodak, so that light hitting such material makes the exposed portions wash away by a subsequent chemical bath, but leaves the unexposed material in a hardened state. Such substrate 2 can be a coarse mask. Ultraviolet light is shown upon the rear portion of the coarse mask so that light penetrates the openings in the coarse mask.

When the mask is developed, the photoresist material is washed away from the holes in the mask but remains as a hardened substance on the portions of the substrate that were not exposed to ultraviolet. The mask and its hardened KMPR material are baked.

A fine mask 4 is then applied and centered onto the photoresist side of the coarse mask and is clamped to the coarse mask 2 by locking devices on the periphery of both masks.

The photoresist layer 3 acts as a heat insulating layer so that any subsequent heating of the compound mask prevents distortion of the fine mask 4.

1

Page 2 of 2

2

[This page contains 2 pictures or other non-text objects]