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Thin Film Insulation Process

IP.com Disclosure Number: IPCOM000096619D
Original Publication Date: 1963-Aug-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Perkins, MH: AUTHOR

Abstract

A coating of polymerized hydrocarbon is deposited to form an insulating film in the construction of electrical devices. Particularly where the insulating film is to be configured by masking, maintenance of low pressures is desirable in the region of deposition. This reduces inter molecule collisions which cause diffusion and loss of definition. Each process uses a relatively restricted pre-treatment chamber in which the monomer gas is exposed to energy while at a relatively high pressure prior to deposition as a polymer in a lower pressure environment. In each process, a vacuum chamber 10 mounts a deposit receiving substrate 12 and is supplied with a suitable gas, such as butadiene, through a needle valve 14, from a supply 16.

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Thin Film Insulation Process

A coating of polymerized hydrocarbon is deposited to form an insulating film in the construction of electrical devices. Particularly where the insulating film is to be configured by masking, maintenance of low pressures is desirable in the region of deposition. This reduces inter molecule collisions which cause diffusion and loss of definition. Each process uses a relatively restricted pre-treatment chamber in which the monomer gas is exposed to energy while at a relatively high pressure prior to deposition as a polymer in a lower pressure environment. In each process, a vacuum chamber 10 mounts a deposit receiving substrate 12 and is supplied with a suitable gas, such as butadiene, through a needle valve 14, from a supply 16.

In the left-hand drawing, the gas is bled through a heated tantalum tube 18 into the vacuum chamber. The end 20 of the tube is open but the elongate shape of the tube yields a degree of confinement. The tube is heated to 1100-1200 degrees C. by current supplied through leads 22 and 24 from a source 26.

In the righthand drawing, the monomer gas is acted upon by a glow charge in a chamber 28 having a restricted orifice 30. The chamber has a filament 32 and an anode 34 for ionizing the gas. The orifice 30 is sized, according to the pumping speed of the vacuum system, to provide pressures in the chamber 28 suitable for glow discharge (10-200 microns Hg) while maintaining low pressures near the substrate (10/-5/ to 1...