Browse Prior Art Database

Inspection System For Evaporation Masks

IP.com Disclosure Number: IPCOM000097073D
Original Publication Date: 1962-May-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 28K

Publishing Venue

IBM

Related People

DeLano, RB: AUTHOR

Abstract

The method detects errors in pattern masks employed in the fabrication of multilayer cryogenic devices.

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Inspection System For Evaporation Masks

The method detects errors in pattern masks employed in the fabrication of multilayer cryogenic devices.

Pattern masks 1 and 3 are employed for successive depositions of superconductive materials forming the gate and control conductors, respectively, of cryogenic devices. Masks 1 and 3 are registered with a negative 5 of that pattern mask employed for depositing insulating layers between said conductors. Both masks 1 and 3 are displaceable within registration tolerances with respect to mask 5.

Light from source 7 is directed through lens 9 to one side of the combination. Lens 11 and photocell 13 are positioned on the opposite side of the combination to detect light transmission through the arrangement. Detection of light through the combination while masks 1 and 3 are displaced is indicative of a mask error.

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