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Vacuum Evaporation Procedure

IP.com Disclosure Number: IPCOM000097147D
Original Publication Date: 1962-Jun-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 75K

Publishing Venue

IBM

Related People

Lentz, JJ: AUTHOR

Abstract

To prevent the outgassing of geometric pattern masks, employed during the thermal evaporation of a material onto a substrate positioned within an evacuated chamber, the masks may be cooled prior to evaporation or during evaporation by a cold gaseous stream. The gas, i. e. nitrogen, is precooled by an appropriate heat exchanger and directed toward the mask.

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Vacuum Evaporation Procedure

To prevent the outgassing of geometric pattern masks, employed during the thermal evaporation of a material onto a substrate positioned within an evacuated chamber, the masks may be cooled prior to evaporation or during evaporation by a cold gaseous stream. The gas, i. e. nitrogen, is precooled by an appropriate heat exchanger and directed toward the mask.

A specific mixture of gases may be employed during evaporation to impart certain properties to the deposited films. For example, trapped gas in the film may be expected to increase the temperature independent resistivity. If, concurrently the mask is kept cool by the stream, undesirable contaminants from the masks are prevented.

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