Browse Prior Art Database

Cleaning Of Aluminum Masks By Precoating

IP.com Disclosure Number: IPCOM000097246D
Original Publication Date: 1962-Aug-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 22K

Publishing Venue

IBM

Related People

Gendron, MF: AUTHOR [+3]

Abstract

The method cleans evaporation masks used in either evaporation or deposition processes or both.

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Cleaning Of Aluminum Masks By Precoating

The method cleans evaporation masks used in either evaporation or deposition processes or both.

Prior to the active deposition process, pattern mask 1 is precoated with a thin layer, e.g., approximately 1000A degrees, of solvent reactive material 3, e.g., indium, and a thin layer, e.g., approximately 1000 A degrees, of silicon monoxide 5 having a residual tensile, stress.

During the deposition process, additional layers of condensates for forming thin film circuitry condense and form as thin layers 7 on the precoated layers 1 and 3. When pattern mask 1 is subjected to the action of a solvent, e.g., chromic phosphoric acid, stressed layer 5 of silicon monoxide tends to peel layer 3 of reactive material from mask 1 and accelerates cleaning action.

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