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Producing Magnetic Layers

IP.com Disclosure Number: IPCOM000098008D
Original Publication Date: 1961-Nov-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Methfessel, S: AUTHOR [+2]

Abstract

The method is employed for the vacuum deposition of thin magnetic layers with low coercive force at high substrate temperature.

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Producing Magnetic Layers

The method is employed for the vacuum deposition of thin magnetic layers with low coercive force at high substrate temperature.

Certain amounts of copper and/or molybdenum and/or chromium are added to the nickel-iron melting source, This contains between 65 and 85 percent nickel, the rest being iron. The percentage of the third component metal to be added to the two components' melting source is determined such that the vapor contains less than about ten percent of the additive.

Thin magnetic layers of thicknesses between several hundred Angstroms and about one-half of a mil are evaporated from such melting sources in the presence of a magnetic field. This occurs at substrate temperatures above 35O degrees C, resulting in good magnetic properties, i.e., low coercive force and good alignment of the magnetization. The quality of the layers is improved by additional annealing at about 500 degrees C for several hours.

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