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Alloy Evaporation Rate Controller

IP.com Disclosure Number: IPCOM000098065D
Original Publication Date: 1961-Dec-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 37K

Publishing Venue

IBM

Related People

Ames, I: AUTHOR [+2]

Abstract

This apparatus controls the composition of vacuum deposited alloy films. Two evaporation source structures, containing selected evaporant materials, are independently heated to vaporize the material in them. The evaporated material is then directed to and deposited upon a substrate. The composition of the deposited alloy film is related to the ratio of the evaporation rates of the materials. Each evaporation rate is determined by the source temperature.

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Alloy Evaporation Rate Controller

This apparatus controls the composition of vacuum deposited alloy films. Two evaporation source structures, containing selected evaporant materials, are independently heated to vaporize the material in them. The evaporated material is then directed to and deposited upon a substrate. The composition of the deposited alloy film is related to the ratio of the evaporation rates of the materials. Each evaporation rate is determined by the source temperature.

A stream of energized electrons ionizes a portion of the evaporated material. The ions are accelerated under the influence of voltage V. They are deflected, through the action of an applied transverse magnetic field. Both the voltage V and magnetic field are applied within a deflection chamber, located so as not to impede the desired deposition. The ions of each material traverse an arc as a result of the applied magnetic field, the radius of which is proportional to the square root of the ion mass. This provides a separation of the selected materials. Next, the ions are individually supplied to a pair of monitor controllers, each of which is operable to adjust the source temperature in order to maintain a predetermined evaporation rate.

Specifically, during the deposition of a lead tin alloy film with an applied voltage V of 10 volts and a magnetic field of 3000 gauss, the lead ions exhibit a radius of curvature of about 2.2 cm. The tin ions exhibit a radius of curvature of about...