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Plating Bath For Thin Magnetic Film

IP.com Disclosure Number: IPCOM000098301D
Original Publication Date: 1960-Jul-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Tsu, I: AUTHOR

Abstract

This plating bath produces a well oriented, uniaxial, anisotropic, thin magnetic film having low coercive force and a high degree of hysteresis loop squareness.

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Plating Bath For Thin Magnetic Film

This plating bath produces a well oriented, uniaxial, anisotropic, thin magnetic film having low coercive force and a high degree of hysteresis loop squareness.

The plating bath contains an essential ingredient of thio (C = S) linkage, as is found in such compounds as thiourea, thioacetamide and thiosemicarbizide. Films prepared from baths containing thio compounds have coercive forces in the order of 0.5 oersteds, Br/Bs ratios in the order of 0.9 and a switching constant of about 0. 15 oersted microseconds.

A suitable bath composition is as follows:

300 grams/liter FeCl2. 4H2O

40 grams/liter NiCl2. 6H2O

180 grams/liter CaCl2

0.2 grams/liter (NH2)2CS

85 grams/liter Fe++ ionic concentration

10 grams/liter Ni+ ionic concentration

The plating is carried out at a current density of 30 amperes per square foot. Thio containing compounds as addition agents are particularly effective in + chloride based bath as contrasted with a sulfate based bath.

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