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Molybdenum Cleaning Solution

IP.com Disclosure Number: IPCOM000098436D
Original Publication Date: 1960-Oct-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hoffman, HS: AUTHOR

Abstract

Molybdenum masks are widely employed in diffusion operations in the manufacture of semiconductor devices. Etching solutions heretofore used to clean those masks left dark surface deposits of chemical reaction products which were difficult to remove.

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Molybdenum Cleaning Solution

Molybdenum masks are widely employed in diffusion operations in the manufacture of semiconductor devices. Etching solutions heretofore used to clean those masks left dark surface deposits of chemical reaction products which were difficult to remove.

When such a mask was placed on a semiconductor wafer in a subsequent diffusion operation, surface contamination undesirably resulted. However, when the following solution is employed to clean the surface of a molybdenum mask, the reaction products are water soluble and can be removed by flushing with a strong stream of water: Nitric acid (concentrated) 150 ml. per liter

Hydrochloric acid (concentrated) 300 ml. per liter

Sulphuric acid (concentrated) 150 ml. per liter

Water 400 ml. per liter

This etchant may also be used to prepare a molybdenum surface to receive a photo-resistant material.

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