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Browse Prior Art Database

Electron Bombardment Evaporation

IP.com Disclosure Number: IPCOM000098463D
Original Publication Date: 1960-Nov-01
Included in the Prior Art Database: 2005-Mar-07
Document File: 2 page(s) / 43K

Publishing Venue

IBM

Related People

Engel, JM: AUTHOR

Abstract

Accurate temperature control is obtained in a vacuum plating apparatus having a vacuum chamber 1 enclosing a crucible 2 containing plating material 3. Also enclosed are a heating coil 4 having a loop 5 above crucible 2, a perforated crucible cover (if needed), a substrate 6 to be plated, and a heated sensing electrode 7 having an applied positive voltage.

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Electron Bombardment Evaporation

Accurate temperature control is obtained in a vacuum plating apparatus having a vacuum chamber 1 enclosing a crucible 2 containing plating material 3. Also enclosed are a heating coil 4 having a loop 5 above crucible 2, a perforated crucible cover (if needed), a substrate 6 to be plated, and a heated sensing electrode 7 having an applied positive voltage.

Coil 4 heats crucible 2 above the vaporization temperature of material 3. A portion of vaporized material 3 is given a negative charge as it passes loop 5. A portion of charged material 3 contacts electrode 7, losing its charge, and is re- emitted to impinge on substrate 6. Electrons lost by vaporized material 3 striking electrode 7 cause a current to flow through resistor 8. The voltage developed across resistor 8 is directly proportional to the rate of material 3 flow between loop 5 and electrode 7. Since the portion of vaporized material 3 which is re- emitted from electrode 7 depends on the temperature of electrode 7, a slider 9 on auto transformer 10 is provided.

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