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Plating Range Testing

IP.com Disclosure Number: IPCOM000098954D
Original Publication Date: 1962-Mar-01
Included in the Prior Art Database: 2005-Mar-08
Document File: 2 page(s) / 37K

Publishing Venue

IBM

Related People

Judge, JS: AUTHOR [+2]

Abstract

This plating range tester utilizes a high resistance cathode to obtain a current density variation along the cathode. Thus, the resultant plating along the cathode displays the effect of the various current densities on the plating.

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Plating Range Testing

This plating range tester utilizes a high resistance cathode to obtain a current density variation along the cathode. Thus, the resultant plating along the cathode displays the effect of the various current densities on the plating.

In the plating range tester shown, the resistance of the cathode is comparable to, or higher than, the effective resistance of the plating solution. This causes a majority of the voltage drop across the cell to occur along the cathode. This voltage drop is comparatively independent of solution resistance and cathode orientation.

The voltage gradient, and hence the current density, along the cathode is controlled by varying such factors as the cathode resistivity, the width of the cathode, and the potential applied. The plating, which thus forms on the cathode, gives evidence of the various plating ranges.

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