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Browse Prior Art Database

Smooth Angled Mirror Facet

IP.com Disclosure Number: IPCOM000099189D
Original Publication Date: 1990-Jan-01
Included in the Prior Art Database: 2005-Mar-14
Document File: 2 page(s) / 45K

Publishing Venue

IBM

Related People

Buchmann, P: AUTHOR [+3]

Abstract

Proposed is a process for etching angled facets smooth surfaces for III-V compound laser and waveguide The technique uses an etch mask which is in situ with the facet etching process. Since the of the mask have exactly the same tilt angle as the detrimental effects from mask edge erosion are

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Smooth Angled Mirror Facet

       Proposed is a process for etching angled facets smooth
surfaces for III-V compound laser and waveguide  The technique uses
an etch mask which is in situ with the facet etching process.  Since
the of the mask have exactly the same tilt angle as the detrimental
effects from mask edge erosion are

      Fig. 1A illustrates the III-V structure to be etched and
multilayer mask used which consists of a hard-baked or polyimide
layer (MASK) with a thin SiO layer top which is patterned a reactive
ion etch (RIE) process using a soft-baked photoresist layer (PR).
Next, as shown in Fig. 1B, highly etch-resistant MASK is formed by
angled 02/Ar assisted ion beam etching (CAIBE), thereby most of the
thin SiO layer.  After reduction of 02 pressure in the system, the
angled mirror facet is into the III-V material in situ by C12/Ar
CAIBE with same substrate tilting angle, i.e., with the same Ar  The
result is illustrated in Fig. 1C.