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Plasma Etch Reactor With Several Electrode Pairs Connected In Parallel

IP.com Disclosure Number: IPCOM000099426D
Original Publication Date: 1990-Jan-01
Included in the Prior Art Database: 2005-Mar-14
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Ruh, WD: AUTHOR

Abstract

A plasma etch reactor has several electrode pairs 2-3 connected in parallel for the HF energy to be applied. Each of the electrode pairs forms an etch cell. For adjusting the etch rate in all cells to the same value, the HF energy is applied by an individually controllable capacitor 4 associated with each etch cell.

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Plasma Etch Reactor With Several Electrode Pairs Connected In Parallel

       A plasma etch reactor has several electrode pairs 2-3
connected in parallel for the HF energy to be applied.  Each of the
electrode pairs forms an etch cell.  For adjusting the etch rate in
all cells to the same value, the HF energy is applied by an
individually controllable capacitor 4 associated with each etch cell.

      Plasma etching is effected in a tank 1, using a gas mixture of
O2+CF4 and a pressure of about 0.3 Torr.  During plasma etching, the
items to be etched are positioned between two electrodes, anode 2 and
cathode 3.  Under the influence of an HF electric field (13.5 MHz), a
plasma containing ions, atoms and radicals is produced, by means of
which epoxy and/or polymers can be etched at high rates.

      To increase the reactor throughput, several such electrode
pairs 2-3 are connected in parallel.  It has been found that the etch
rate decreases from the center to the outer electrode pairs.  This
decrease is attributable to the different distribution of the HF
energy to the individual electrode pairs and to increased heat
dissipation of the outer electrode pairs.

      To obtain a uniform etch rate for electrode pairs 2-3, the etch
rate in the outer electrodes is increased, while that of the center
electrodes is reduced, if necessary.  For this purpose, the
individual cathodes 3 are connected to the common HF supply of an HF
generator 5 by separately contr...