Browse Prior Art Database

Thin Foil Masks Produced by Laser-Assisted Etching

IP.com Disclosure Number: IPCOM000100411D
Original Publication Date: 1990-Apr-01
Included in the Prior Art Database: 2005-Mar-15
Document File: 2 page(s) / 61K

Publishing Venue

IBM

Related People

Hussey, B: AUTHOR [+2]

Abstract

This article describes a method of generating mask patterns on thin metallic foils, for use in molecular beam systems, optical systems, or ablation/deposition systems. The technique uses laser-assisted wet etching to produce features of smaller dimensions than could otherwise be obtained with ion milling or electro-discharge machining. The actual dimensions achieved are a function of thermal properties of the particular metal foil to be etched, as well as the choice of optics and laser parameters.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 64% of the total text.

Thin Foil Masks Produced by Laser-Assisted Etching

       This article describes a method of generating mask
patterns on thin metallic foils, for use in molecular beam systems,
optical systems, or ablation/deposition systems. The technique uses
laser-assisted wet etching to produce features of smaller dimensions
than could otherwise be obtained with ion milling or
electro-discharge machining. The actual dimensions achieved are a
function of thermal properties of the particular metal foil to be
etched, as well as the choice of optics and laser parameters.

      An Ar+ ion laser beam 1 is incident upon an optical array
consisting os a beamsplitter 2, camera 3, and positive lens 4.  The
camera 3 also contains an illumination which can deliver white light
through the beamsplitter to provide monitoring of the workpiece.  To
minimize the focussed beam waist, a lens corrected for Gaussian beam
intensity can be used to obtain a diffraction-limited spot size.  The
lens is positioned to focus the beam directly at the surface of the
foil 5, which is immersed in a liquid solution reservoir, 7.  The
liquid can be an alkaline salt solution, such as KOH or NaOH, or a
neutral

      The foil 5 is secured during the etch process by means of a
vice clamp 6 which holds the foil from two sides.  The two jaws of
clamp 6 are aligned by means of two dowel pins 8, rigidly fixed on
the left side of 6 and sliding freely through the right side of the
clamp.  The center region of p...