Browse Prior Art Database

Resist Coater Monitoring System

IP.com Disclosure Number: IPCOM000101095D
Original Publication Date: 1990-Jun-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 1 page(s) / 28K

Publishing Venue

IBM

Related People

Kise, H: AUTHOR [+2]

Abstract

A resist coater monitoring system is disclosed which detects the concentration of an organic solvent gas from the resist to quantify the amount of the resist applied on a patterned wafer.

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Resist Coater Monitoring System

       A resist coater monitoring system is disclosed which
detects the concentration of an organic solvent gas from the resist
to quantify the amount of the resist applied on a patterned wafer.

      The amount of resist coated on a patterned wafer by spin
coating can be estimated by the following:
   A = B - C x D/E
where A: amount of resist coated on patterned wafer (grams)
       B: amount of resist dispensed on wafer (grams)
       C: amount of resist coated on unpatterned wafer (grams)
   D: peak solvent gas concentration in coater when resist is applied
on unpatterned wafer (ppm)
       E: peak solvent gas concentraion in coater when resist is
applied on patterned wafer (ppm)
The peak solvent gas concentration can be detected by gas monitor
device 1 which is attached in the exhaust duct 2 of the resist
coater.  Measured values are sent to processor 3.

      The measurement of the gas concentration may be used to contol
or halt the coating operation when the measured value exceeds a limit
to prevent explosion of the gas.