Browse Prior Art Database

Improvements to Photoresist Stripper Tools

IP.com Disclosure Number: IPCOM000101179D
Original Publication Date: 1990-Jul-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 2 page(s) / 51K

Publishing Venue

IBM

Related People

Fournier, B: AUTHOR [+2]

Abstract

Standard downstream photoresist strippers, such as the TEGAL 905 tool manufactured by Tegal Corp., Petaluma, California, can be modified, by the addition of a gas distributor to improve the uniformity. This article is intended to demonstrate the process performances obtained with the modified tool.

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Improvements to Photoresist Stripper Tools

       Standard downstream photoresist strippers, such as the
TEGAL 905 tool manufactured by Tegal Corp., Petaluma, California, can
be modified, by the addition of a gas distributor to improve the
uniformity. This article is intended to demonstrate the process
performances obtained with the modified tool.

      Unusually, the chamber consists of a quartz bell jar with one
gas inlet mounted to an aluminum mounting plate with radial exhaust
ports.  The RF and ground electrodes are circular bands attached to
the outside quartz bell jar at a location well above the wafer. The
plasma is generated in the upper part of the chamber. There is no RF
connection to the wafer chuck. The optimum conditions were found to
be at 3.5 Torr and 800 watts.  Unfortunately, standard tools have low
etch uniformity because the gases are not delivered in the chamber
with a good homogeneity.

      Typical results that are obtained with a standard tool are
given below:
      Uniformity: > 50% (Max-Min)
      Etch rate : 14,000 A/min

      To solve this concern, a gas distributor or diffusor has been
designed  which is shown in the figure. This gas distributor consists
of an aluminum shower and replaces the original gas inlets. This
shower is in a floating mode in the plasma generation zone. The
objective of the shower design is to generate reactive species in the
plasma zone to etch the wafer with good uniformity.

      R...