Browse Prior Art Database

Uniform Array of Small Metal Balls

IP.com Disclosure Number: IPCOM000101209D
Original Publication Date: 1990-Jul-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 2 page(s) / 60K

Publishing Venue

IBM

Related People

Hodgson, RT: AUTHOR [+3]

Abstract

Disclosed is a method for producing uniform arrays of small solid or liquid metal balls. Superconducting arrays of balls have been suggested as very sensitive neutrino detectors (1). In addition, gallium balls show promise in detectors for particles with axial couplings (i.e., photinos) (2). In this type of detector, the balls are driven out of the superconducting state in a magnetic field by the heat deposited by an incident neutrino. The resultant change in the magnetic field linked into a SQUID magnetometer is then used to detect the path of the incident neutrino. The grain size determines the energy sensitivity of the detector. Micron sized grains correspond to energies in the keV range.

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Uniform Array of Small Metal Balls

       Disclosed is a method for producing uniform arrays of
small solid or liquid metal balls.  Superconducting arrays of balls
have been suggested as very sensitive neutrino detectors (1).  In
addition, gallium balls show promise in detectors for particles with
axial couplings (i.e., photinos) (2).  In this type of detector, the
balls are driven out of the superconducting state in a magnetic field
by the heat deposited by an incident neutrino.  The resultant change
in the magnetic field linked into a SQUID magnetometer is then used
to detect the path of the incident neutrino.  The grain size
determines the energy sensitivity of the detector.  Micron sized
grains correspond to energies in the keV range.

      The resolution of this class of detectors is improved
dramatically if the balls are of uniform size and distribution, and
if large arrays of sub-micron diameter balls can be fabricated.

      A glass or quartz substrate, or a substrate which is wet by a
liquid metal, is covered with a thin layer of photoresist which is
not wet by the metal.  The photoresist is exposed by the interference
pattern of intersecting beams of a short wavelength laser such as a
He-Cd laser  which will expose the photoresist in a pattern of
parallel lines. If the exposure is more than half that needed to
expose the photoresist at the maximum of the intensity of the
holographic pattern, the substrate can be rotated by 90 degrees and
ree...