Browse Prior Art Database

Insulating Cathode Disk for SiO2 Sputter Systems

IP.com Disclosure Number: IPCOM000101515D
Original Publication Date: 1990-Aug-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 1 page(s) / 32K

Publishing Venue

IBM

Related People

Jurczyk, DH: AUTHOR [+2]

Abstract

A modification has been proposed for SiO2 sputter systems which will alleviate tuning problems. This proposal would substitute a solid dielectric for the conventional vacuum gap, thereby improving tool stability by providing a very narrow tuning point.

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Insulating Cathode Disk for SiO2 Sputter Systems

       A modification has been proposed for SiO2 sputter systems
which will alleviate tuning problems.  This proposal would substitute
a solid dielectric for the conventional vacuum gap, thereby improving
tool stability by providing a very narrow tuning point.

      Tuning problems in the sputter system are primarily caused by
variable interelectrode capacitance between the back of the Cu
cathode and the top of the vacuum chamber wall.  The vacuum gap
normally maintained between the cathode and the process chamber is
difficult to tune and has an associated capacitance which creates
high losses in the match box.

      It is suggested that a fixed dielectric disk 1 be mounted on
the insulator hub 2 of the cathode as a substitute for the vacuum
gap.  The disk would be made of a plastic dielectric compatible with
the sputtering system operation.  It can easily be formed to the
desired thickness.  This disk would assure parallel spacing of the
component, a factor critical to the operation of the system, and
simplify tuning of the tool.  Additionally, the life of the matching
network capacitor should be extended without the capacitances
associated with the vacuum gap.