Browse Prior Art Database

Drying Dielectrics by Means of Remote Field Microwaves

IP.com Disclosure Number: IPCOM000101625D
Original Publication Date: 1990-Aug-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 2 page(s) / 44K

Publishing Venue

IBM

Related People

Butz, M: AUTHOR [+4]

Abstract

This article describes a drying process for microporous solid-state devices. The described process is marked by a high degree of efficiency which is obtained by the use of a high-frequency remote field.

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Drying Dielectrics by Means of Remote Field Microwaves

       This article describes a drying process for microporous
solid-state devices.  The described process is marked by a high
degree of efficiency which is obtained by the use of a high-frequency
remote field.

      Conventional thermal and convection drying processes are based
on heating the entire material.  In addition to a low yield of about
10%, such heating may lead to surface changes of the polymer to be
dried with the adverse effect that adsorbed solvent is prevented from
escaping through the recticulated surface even at high temperatures.

      When the ceramic to be dried is irradiated by a high-frequency
wave, the latter is absorbed as a function of its frequency and the
physical constants of the ceramic.  At a typical frequency in the GHz
range (say, 2.4 GHz corresponding to a wavelength of 12.5 cm), this
power absorption in the remote field may exceed 40%.  By the
formation of standing waves and by inductive effects, the metallic
regions in the solid-state device are locally heated.  In addition,
the liquid to be desorbed is capable of absorbing the incident
radiation with the result that the ceramic is dried without chemical
or physical changes.

      The figure is a schematic of the arrangement used to implement
the proposed process.  The high-frequency wave produced in magnetron
1 is applied to substrate 2 positioned on a rotary means 3 to
compensate for inhomogeneities of the...