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Method of Producing Graded Refractive Index Surfaces in SiO2 And SiO

IP.com Disclosure Number: IPCOM000101774D
Original Publication Date: 1990-Aug-01
Included in the Prior Art Database: 2005-Mar-16
Document File: 1 page(s) / 21K

Publishing Venue

IBM

Related People

Baglin, J: AUTHOR [+3]

Abstract

It has been found that electron beam deposition of SiO2 and SiO on silicon, glass, metals or graphite produces a layer having a refractive index h which depends on the angle of incidence of the deposit.

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Method of Producing Graded Refractive Index Surfaces in SiO2 And SiO

       It has been found that electron beam deposition of SiO2
and SiO on silicon, glass, metals or graphite produces a layer having
a refractive index h which depends on the angle of incidence of the
deposit.

      The value of h varies from 1.1 at 6o grazing incidence to about
1.46 at normal incidence.

      A transparent coating on bulk glass having an index of
refraction which varies gradually from about the value of h of the
bulk glass to about 1.0 at the air surface acts as an anti-reflection
coating having a broad wavelength range of applicability.

      Such a coating can be made by depositing SiO2 or SiO while
continuously controlling the h-profile by controlling the angle of
tilt during deposition.