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Browse Prior Art Database

Excimer Laser Objective Lens

IP.com Disclosure Number: IPCOM000101862D
Original Publication Date: 1990-Sep-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Herring, FA: AUTHOR [+2]

Abstract

The excimer laser objective is used in a custom-designed micro-machining system to remove thin film metallurgy from glass/ceramic substrates. The system is used to repair internal shorts and custom engineering changes. The objective is an infinite conjugate (F/5.124) design which is diffraction limited at .308 micron wavelength on axis and also up to an image height equal to 1.3416 mm. The seven-element lens is achromatic between .308 micron wavelength and yellow light centered at .5876 micron. The axial modulated transfer function response curve, while not being diffraction limited, is better than the Rayleigh limit. The objective lens is excellent for use at .308 micron wavelength and good for use with yellow light.

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Excimer Laser Objective Lens

       The excimer laser objective is used in a custom-designed
micro-machining system to remove thin film metallurgy from
glass/ceramic substrates.  The system is used to repair internal
shorts and custom engineering changes.  The objective is an infinite
conjugate (F/5.124) design which is diffraction limited at .308
micron wavelength on axis and also up to an image height equal to
1.3416 mm.  The seven-element lens is achromatic between .308 micron
wavelength and yellow light centered at .5876 micron.  The axial
modulated transfer function response curve, while not being
diffraction limited, is better than the Rayleigh limit.  The
objective lens is excellent for use at .308 micron wavelength and
good for use with yellow light.