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Resistless Patterned Laser Etching

IP.com Disclosure Number: IPCOM000102134D
Original Publication Date: 1990-Oct-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 47K

Publishing Venue

IBM

Related People

Houle, F: AUTHOR [+3]

Abstract

A reduction optical system focuses laser energy on the substrate and causes a reaction between the substrate and surrounding gas. This reaction forms a volatile product which can be removed by pumping (or a non-volatile product is formed and subsequently removed by a further gasification process or a washing process). Other mechanisms in which the gas surrounding the substrate is excited and forms reactive species are also known to occur.

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Resistless Patterned Laser Etching

       A reduction optical system focuses laser energy on the
substrate and causes a reaction between the substrate and surrounding
gas.  This reaction forms a volatile product which can be removed by
pumping (or a non-volatile product is formed and subsequently removed
by a further gasification process or a washing process).  Other
mechanisms in which the gas surrounding the substrate is excited and
forms reactive species are also known to occur.

      Examples of these processes include the etching of polymers in
an oxygen atmosphere using 185 nm radiation, etching of metals in
halogenated gases and also the etching of insulators in halogenated
gases.  The use of an optical reduction system to perform this
etching process enables the use of photon densities in the plane of
the projection mask which may be at least two orders of magnitude
lower than in the plane of the substrate to be etched.  This improves
mask lifetime.

      By using this technique no resist mask on the substrate is
required.  This represents cost savings and allows the plane of the
substrate to be remote from the mask, thus avoiding problems of
deposition or etching of the mask by the ambient atmosphere.
Furthermore, no distortion of the mask by heating or damage to the
mask by sample loading/unloading will occur.

      Detailed examples of these processes may include the formation
of patterns in polymers which absorb strongly at the irradiati...