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Adhesion Enhancement of Aluminum on Polyvinylbutyral

IP.com Disclosure Number: IPCOM000102158D
Original Publication Date: 1990-Oct-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 51K

Publishing Venue

IBM

Related People

Afzali-Ardakani, A: AUTHOR [+3]

Abstract

A method is disclosed for enhancing adhesion between a polymer, polyvinylbutyral (commercially obtainable as BUTVAR*) and aluminum. A Direct Negative-Direct Plate (DN/DP) created by electro-erosion consists of a multilayer structure in which a BUTVAR-silica composite is coated on a polyester substrate and then a thin (300-500) Angstrom) film of aluminum is vacuum deposited. The DN/DP when used for printing is subject to scratching and abrasion both during normal handling and more importantly during use as a direct plate on an offset press. Many studies have shown that adhesion of the aluminum film to the BUTVAR underlayer plays a major role in the press life.

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Adhesion Enhancement of Aluminum on Polyvinylbutyral

       A method is disclosed for enhancing adhesion between a
polymer,  polyvinylbutyral (commercially obtainable as BUTVAR*) and
aluminum.  A Direct Negative-Direct Plate (DN/DP) created by
electro-erosion consists of a multilayer structure in which a
BUTVAR-silica composite is coated on a polyester substrate and then a
thin (300-500) Angstrom) film of aluminum is vacuum deposited.  The
DN/DP when used for printing is subject to scratching and abrasion
both during normal handling and more importantly during use as a
direct plate on an offset press.  Many studies have shown that
adhesion of the aluminum film to the BUTVAR underlayer plays a major
role in the press life.  Prior studies have also shown that ashing in
the oxygen atmosphere of a cellulosic-based underlayer prior to
aluminum evaporation improves the adhesion of the metal to the
basecoat. However, this treatment does not lead to a similar
improvement in the case of the BUTVAR composite base layer. Further,
sputtering, as compared to evaporation, in itself does not result in
any change.

      Two objectives, namely better adhesion and a one-step process,
were achieved using a modified RF sputtering technique for the
aluminum deposition.  A basecoat, that was kept at RT during
sputtering, was exposed for 40 seconds to sputter etch prior to
deposition, and this was continued for the first 2 minutes of
aluminum deposition.  The anode voltage was ke...