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X-Ray Assisted Electroplating

IP.com Disclosure Number: IPCOM000102661D
Original Publication Date: 1990-Dec-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 2 page(s) / 65K

Publishing Venue

IBM

Related People

Acosta, RE: AUTHOR [+2]

Abstract

When conventional electroplating is performed with the cathode bombarded by X-rays, the electroplating rate is increased considerably from the rate expected from Faraday's Law.

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This is the abbreviated version, containing approximately 55% of the total text.

X-Ray Assisted Electroplating

       When conventional electroplating is performed with the
cathode bombarded by X-rays, the electroplating rate is increased
considerably from the rate expected from Faraday's Law.

      In an experimental apparatus, shown in Fig. 1, a cathode was
formed by coating one side of a thin layer mylar membrane (about 2 mm
thick) with a thin layer of Cr-Au.  The membrane was placed upside
down on top of an electrolytic cell 10 with the Cr-Au cathode side in
contact with the Au plating bath.

      In a first experiment, the photocurrent produced when the cell
was irradiated with A1 (1.5 kV) X-rays at a flux density of about 5
mJ/Cm2/min was measured across terminals 14, 15 connected between the
cathode 12 and a platinum anode 16.  The X-rays 11 impinged the Cr-Au
film 12 through the mylar membrane 13, as shown in Fig. 1.  The
photocurrent produced, with no external excitation, was about 4.5 mA.
This current increased smoothly with increasing incident X-ray flux
and showed some hysteresis with decreasing incident X-ray flux.  We
observed no photocurrent change until the X-ray flux was decreased to
about 1 mJ/cm2/min.  In this experiment, we observed no significant
metal deposition on the cathode.  However, considerable radiation
damage was observed on the mylar film after 14 hours of X-ray
irradiation.

      In a second experiment, the plating bath was driven via
terminals 14, 15 with an external current source of 4.5 mA. Th...