Browse Prior Art Database

Method to Improve Resolution in X-Ray Lithography

IP.com Disclosure Number: IPCOM000102696D
Original Publication Date: 1990-Dec-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 3 page(s) / 82K

Publishing Venue

IBM

Related People

Maldonado, JR: AUTHOR [+2]

Abstract

This article describes methods to improve the replication resolution of X-ray lithography by externally controlling the geometrical image blur of the X-ray source. The resolution of X-ray lithography systems is limited by diffraction considerations. It can be shown that the beam divergence, and source size, also influence the ability of an X-ray lithography system to replicate simultaneously several feature shapes.

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Method to Improve Resolution in X-Ray Lithography

       This article describes methods to improve the replication
resolution of X-ray lithography by externally controlling the
geometrical image blur of the X-ray source.  The resolution of X-ray
lithography systems is limited by diffraction considerations.  It can
be shown that the beam divergence, and source size, also influence
the ability of an X-ray lithography system to replicate
simultaneously several feature shapes.

      X-ray lithography simulations utilizing the XMAS and SHADOW
programs indicate that beam divergency, and penumbra blur (source
size) play an important role in the maximum attainable resolution and
working distance in X-ray proximity lithography.  This effect is
shown in Fig.  1, using the XMAS program to calculate the dose
profile in the resist from a storage ring with small divergence, and
a storage ring with a 7 mrad divergence.  The dose profile from the
larger divergence ring is smoother, and allows a larger processing
window.  Several methods are proposed in this disclosure to improve
the resolution during X-ray lithography, by controlling the
geometrical image blur of the X-ray source, and therefore smoothing
out the dose profile in the resist.
-  One method consists of moving the wafer, in the wafer plane (X-Y),
relative to the mask by suitable means (i.e., piezo-electric
actuators).  The motion should be performed so to obtain a uniform
geometrical blur in the X-Y plane.  T...