Browse Prior Art Database

Etcher Spray Chamber

IP.com Disclosure Number: IPCOM000102754D
Original Publication Date: 1990-Jan-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 22K

Publishing Venue

IBM

Related People

Knight, JA: AUTHOR

Abstract

In an etching system, a horizontal spray etch chamber, which is particularly designed for using potassium permanganate and sodium hydroxide as an etching solution, is basically constructed of stress-relieved polypropylene of appropriate thickness and is fusion welded to form the etching chamber.

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Etcher Spray Chamber

      In an etching system, a horizontal spray etch chamber, which is
particularly designed for using potassium permanganate and sodium
hydroxide as an etching solution, is basically constructed of
stress-relieved polypropylene of appropriate thickness and is fusion
welded to form the etching chamber.

      Also, commercially available low-energy high-volume impeller
pumps in combination with connected plumbing designed to maintain
relatively constant pressure and flow at the spray head(s), are used
to provide the etching system with a longer operating life and better
maintainability than previous arrangements.

      Disclosed anonymously.