Browse Prior Art Database

Process Method for Making a Sharp Tip

IP.com Disclosure Number: IPCOM000102865D
Original Publication Date: 1990-Mar-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 28K

Publishing Venue

IBM

Related People

Cronin, JE: AUTHOR

Abstract

Tips, which are sharp on an atomic scale, are needed for field emission devices, scanning tunneling microscopes (STMs), and atomic force microscopes (AFMs). Such tips may be formed by a stud process followed by etching at an angle by a process, such as reactive ion beam etching (RIBE).

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Process Method for Making a Sharp Tip

      Tips, which are sharp on an atomic scale, are needed for field
emission devices, scanning tunneling microscopes (STMs), and atomic
force microscopes (AFMs).  Such tips may be formed by a stud process
followed by etching at an angle by a process, such as reactive ion
beam etching (RIBE).

      Referring to the figure, insulator 2 is deposited on substrate
4.  Then, a hole is etched in insulator 2 and a conductor 6, e.g.,
tungsten, is conformally deposited and planarized to the level of the
top surface of insulator 2. By rotating the substrate and directing
an ion beam at an angle A to the substrate surface, conductor 6 is
removed selectively to create a conical tip as shown.  Insulator 2
may be removed if necessary for the application, e.g., in STM and AFM
applications.

      Disclosed anonymously.