Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Electrochemical Decoration Technique for Defects and Porosity in Thin Film Disk Structures

IP.com Disclosure Number: IPCOM000103050D
Original Publication Date: 1990-May-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 21K

Publishing Venue

IBM

Related People

Howard, J: AUTHOR [+3]

Abstract

A simple and fast droplet test with diluted solution of either silver nitrate or copper sulfate (0.01 to 0.0001 m) provides visual detection within minutes of corrosion sites on surfaces of thin film disks. In areas with overcoat discontinuities, the solution wets the cobalt alloy thin film and nuclei of metallic silver or copper grow due to the electrochemical displacement reaction Co(solid) + Ag(solution) ---- Co(solution) + Ag(solid). The sensitivity of the method is optimized by concentration and exposure time of the solution.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Electrochemical Decoration Technique for Defects and Porosity in Thin Film Disk Structures

      A simple and fast droplet test with diluted solution of either
silver nitrate or copper sulfate (0.01 to 0.0001 m) provides visual
detection within minutes of corrosion sites on surfaces of thin film
disks.  In areas with overcoat discontinuities, the solution wets the
cobalt alloy thin film and nuclei of metallic silver or copper grow
due to the electrochemical displacement reaction Co(solid) +
Ag(solution) ---- Co(solution) + Ag(solid).  The sensitivity of the
method is optimized by concentration and exposure time of the
solution.

      Disclosed anonymously.