Browse Prior Art Database

High Capacity Sputter Pallet

IP.com Disclosure Number: IPCOM000103301D
Original Publication Date: 1990-Sep-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 38K

Publishing Venue

IBM

Related People

Kruger, BP: AUTHOR

Abstract

Disclosed is a position configuration used to allow sputter pallets or carriers to hold the maximum number of substrates during the sputtering process. With this configuration the disk rows are offset from each other, where the top row is aligned between the row below it.

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This is the abbreviated version, containing approximately 100% of the total text.

High Capacity Sputter Pallet

      Disclosed is a position configuration used to allow sputter
pallets or carriers to hold the maximum number of substrates during
the sputtering process.  With this configuration the disk rows are
offset from each other, where the top row is aligned between the row
below it.

      The pallet or carrier illustrated in the figure is machined out
of 2024 aluminum plate with a thickness of 6.35mm.  The width is
734mm with a height of 660mm.  The pallet holds 23 130mm substrates.

      To obtain the highest capacity possible, the center to center
distance between the substrates are minimized in both the horizontal
(D1) and vertical (D2) positions.  The pallet strength and rigidity
will be maintained if proper hole design is incorporated in the
pallet.  The design should leave as much material around the disk as
possible.

      Disclosed anonymously.