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Browse Prior Art Database

Fluorescence Monitoring for Photoresist Exposure Control

IP.com Disclosure Number: IPCOM000103332D
Original Publication Date: 1990-Oct-01
Included in the Prior Art Database: 2005-Mar-17
Document File: 1 page(s) / 30K

Publishing Venue

IBM

Related People

Humphrey, DC: AUTHOR

Abstract

Total actinic radiation from an exposure system is controlled from measurement of emitted fluorescent radiation caused by photochemical reaction in photoresist during exposure. Thus, proper dose control is achieved with minimum error due to photoresist variations, e.g., thickness or photoactive compound concentration.

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This is the abbreviated version, containing approximately 100% of the total text.

Fluorescence Monitoring for Photoresist Exposure Control

      Total actinic radiation from an exposure system is controlled
from measurement of emitted fluorescent radiation caused by
photochemical reaction in photoresist during exposure.  Thus, proper
dose control is achieved with minimum error due to photoresist
variations, e.g., thickness or photoactive compound concentration.

      Referring to the figure, some of emitted fluorescent radiation
2 from photoresist 4 is collected by a means, e.g., lens 6, and
transmitted through filter 8 to photomultiplier tube (PMT) 10.
Filter 8 is selected to transmit only radiation emitted during
photochemical reaction.  Relative fluorescent radiation intensity, as
detected by PMT 10, is acted upon in controller 12 to control
intensity and/or shut off actinic light 14 from its source in
exposure system 16.

      Disclosed anonymously.