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Browse Prior Art Database

Curable Silicaceous Barrier Layer for Multilayer Resists

IP.com Disclosure Number: IPCOM000103488D
Original Publication Date: 1990-Dec-01
Included in the Prior Art Database: 2005-Mar-18
Document File: 1 page(s) / 29K

Publishing Venue

IBM

Related People

Lee, YL: AUTHOR [+4]

Abstract

Silica-like barrier layers for multilayer resist formation are commonly formed from spun-on glass resin derived from polysilsesquioxane polymers such as OWENS ILLINOIS 650 glass resin. The films are coated on top of an underlayer material and cured at temperatures of 230-270oC. Cracks are often noted in the cured film or after development of the image layer in aqueous alkaline developer. Stable and crack-free silicaceous barrier layers can be provided by the addition of a curing agent to the barrier resin. The addition of 1% by weight of p-toluene sulfonic acid to OWENS ILLINOIS GR100F glass resin at 105 by eight of total solids films which exhibit reactive ion etching characteristics well suited for MLR image transfer. The resin solutions are also stable for several months at room temperature.

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Curable Silicaceous Barrier Layer for Multilayer Resists

      Silica-like barrier layers for multilayer resist formation are
commonly formed from spun-on glass resin derived from
polysilsesquioxane polymers such as OWENS ILLINOIS 650 glass resin.
The films are coated on top of an underlayer material and cured at
temperatures of 230-270oC.  Cracks are often noted in the cured film
or after development of the image layer in aqueous alkaline
developer.  Stable and crack-free silicaceous barrier layers can be
provided by the addition of a curing agent to the barrier resin.  The
addition of 1% by weight of p-toluene sulfonic acid to OWENS ILLINOIS
GR100F glass resin at 105 by eight of total solids films which
exhibit reactive ion etching characteristics well suited for MLR
image transfer.  The resin solutions are also stable for several
months at room temperature.

      Disclosed anonymously.