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Localized Deposition of Palladium with Visible Light

IP.com Disclosure Number: IPCOM000103506D
Original Publication Date: 1990-Dec-01
Included in the Prior Art Database: 2005-Mar-18
Document File: 1 page(s) / 24K

Publishing Venue

IBM

Related People

Moylan, CR: AUTHOR [+2]

Abstract

Irradiation of a solid substrate immersed in a 10-2 M solution of sodium hexachloropalladate in a 6:1 isopropanol:water mixture leads to the deposition of palladium metal in the irradiated area due to an unusual four-electron reduction of the metal induced photochemically. The treated surface is sufficiently seeded with palladium to plate nickel from an electroless plating bath. Since palladium metal is the best seeder for electroless plating in general, the visible light photochemical process provides a means for direct writing of seeder patterns on substrates and, therefore, direct writing of any metal that can be deposited by electroless plating.

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Localized Deposition of Palladium with Visible Light

      Irradiation of a solid substrate immersed in a 10-2 M solution
of sodium hexachloropalladate in a 6:1 isopropanol:water mixture
leads to the deposition of palladium metal in the irradiated area due
to an unusual four-electron reduction of the metal induced
photochemically.  The treated surface is sufficiently seeded with
palladium to plate nickel from an electroless plating bath.  Since
palladium metal is the best seeder for electroless plating in
general, the visible light photochemical process provides a means for
direct writing of seeder patterns on substrates and, therefore,
direct writing of any metal that can be deposited by electroless
plating.

      Disclosed anonymously.