Browse Prior Art Database

Ion Implantation in Thin Film Overcoats for Magnetic Disks

IP.com Disclosure Number: IPCOM000104158D
Original Publication Date: 1993-Mar-01
Included in the Prior Art Database: 2005-Mar-18
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Bleich, H: AUTHOR [+4]

Abstract

Described is an ion implantation technique to improve the wear resistance of carbon overcoats for thin film magnetic disks. The implantations were done with N+ or N2+ at dosages between 1E14 to 1E16 atoms/cm2. The beam energy used was varied between 10 to 40

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Ion Implantation in Thin Film Overcoats for Magnetic Disks

      Described is an ion implantation technique to improve the wear
resistance of carbon overcoats for thin film magnetic disks.  The
implantations were done with N+ or N2+ at dosages between 1E14 to
1E16 atoms/cm2.  The beam energy used was varied between 10 to 40

KeV.  The effect of nitrogen ion implantation on the properties of
carbon films is summarized in Table 1 and 2.

                                 Table 1

                           Implanted ion = N+

_____________________________________________________________________
___
  Beam energy        Dosage        Time        Stress       Hardness

   Not implanted reference sample              -1215 MPa     17.0 KPa

     40 KeV            1E14        30 sec      -1020 MPa     18.9 KPa

     40 KeV            1E16        60 min      -1067 MPa     11.2 KPa
_____________________________________________________________________
___

                                 Table 2

                           Implanted ion = N2+

_____________________________________________________________________
___
  Beam energy        Dosage        Time        Stress       Hardness

   Not implanted reference sample              -950 MPa  ...