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Pit Corrosion Inhibition in Sputtered Thin Films

IP.com Disclosure Number: IPCOM000104431D
Original Publication Date: 1993-Apr-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Farrow, MM: AUTHOR [+2]

Abstract

Many sputter deposited metal films, particularly those with iron as a major component, are subject to pitting corrosion. This type of corrosion is generally damaging to the function of the part. This applies to MO (magneto-optic) media, the thin film head, the thin film disk and other sputtered film products.

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Pit Corrosion Inhibition in Sputtered Thin Films

      Many sputter deposited metal films, particularly those with
iron as a major component, are subject to pitting corrosion.  This
type of corrosion is generally damaging to the function of the part.
This applies to MO (magneto-optic) media, the thin film head, the
thin film disk and other sputtered film products.

      In the case of MO media, we have discovered that this pitting
corrosion in sputter deposited thin metal films is a strong function
of the sputter deposition conditions.  Films fabricated to be
microporous show low pitting corrosion while very dense films have a
high pitting corrosion rate.  Among the fabrication conditions for
magnetron sputtering that make films microporous are [1]  higher
sputter gas pressure, slow deposition rates, structured substrates,
high angle deposition, no rf bias.

      In particular, measurements at 50ºC and 85% RH of high
compressive stress Iron Terbium Cobalt magneto optical films
fabricated at 3&mu.  sputter gas pressure pit corrode at 2000&mu.
sup 2 /minute but low compressive stress films fabricated at 15&mu.
putter gas pressure show approximately zero pit corrosion (figure).
The intermediate curves are intermediate stress films.

      Finally, the film's structural change with fabrication
conditions also effects the magnetic and other film properties so
that the effectiveness of pitting corrosion reduction by film
structure modification depends on c...