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Diamond Deposition using Methanol and Rare Gas Mixture

IP.com Disclosure Number: IPCOM000104473D
Original Publication Date: 1993-Apr-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 55K

Publishing Venue

IBM

Related People

Buck, M: AUTHOR [+4]

Abstract

Disclosed is a method of the use of gas feedstock consisting of a methanol and rare gas mixture for the deposition of high quality diamond thin films. In most cases the deposition has been done using a very dilute mixture of some hydrocarbon molecules in hydrogen, usually of the order of 1 percent or less >1|. The deposition involves the formation of a plasma by hot tungsten filament, microwave stimulation of rf discharge. It is generally believed that atomic hydrogen generated in the plasma plays a crucial role in preventing the formation of graphitic carbon and allowing the growth of diamond. In 1986 Hirose et al demonstrated that O and N containing organic can also be used with hydrogen gas >2|, and later in 1988 they showed that diamond could be deposited with a mixture of methane and oxygen, i.e.

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Diamond Deposition using Methanol and Rare Gas Mixture

      Disclosed is a method of the use of gas feedstock consisting of
a methanol and rare gas mixture for the deposition of high quality
diamond thin films.  In most cases the deposition has been done using
a very dilute mixture of some hydrocarbon molecules in hydrogen,
usually of the order of 1 percent or less >1|.  The deposition
involves the formation of a plasma by hot tungsten filament,
microwave stimulation of rf discharge.  It is generally believed that
atomic hydrogen generated in the plasma plays a crucial role in
preventing the formation of graphitic carbon and allowing the growth
of diamond.  In 1986 Hirose et al demonstrated that O and N
containing organic can also be used with hydrogen gas >2|, and later
in 1988 they showed that diamond could be deposited with a mixture of
methane and oxygen, i.e., is without additional hydrogen >3|.  The
experiments by Hirose et al were carried out using the hot filament
technique.

      Diamond films have been deposited here using mixtures of
methanol and rare gas in a microwave generated plasma.  The quality
of the deposited diamond is based on Raman spectra meaning that the
background level, usually due to graphitic carbon, is low and the
diamond peak at 1332cm(-1)  is sharp.  The total pressure of the gas
during deposition is &app.55 Torr with a flow rate of &app.100 sccm.
The temperature of the substrate is maintained at about 800(o)C
during depositi...