Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Brush Cleaning for Conveyer-Type Wafer Annealing Furnace

IP.com Disclosure Number: IPCOM000104579D
Original Publication Date: 1993-May-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Inoue, K: AUTHOR [+2]

Abstract

Disclosed is a conveyer belt cleaning system for a wafer annealing furnace. A rotating brush removes particles and contaminants on the conveyer belt effectively.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Brush Cleaning for Conveyer-Type Wafer Annealing Furnace

      Disclosed is a conveyer belt cleaning system for a wafer
annealing furnace.  A rotating brush removes particles and
contaminants on the conveyer belt effectively.

      In certain steps of semiconductor manufacturing, a conveyer
type furnace may be used to convey wafers through the furnace and
anneal them at high temperatures.  However, such a furnace has the
problem that particles and contaminants from the belt and associated
drive mechanism adhere to the back side of the conveyed wafer and,
when loaded into a wafer cassette, transfer to the top surface of the
next wafer below.  Such particles may cause various defects including
short-circuiting of the wiring conductors on the wafer, in
particular, when a metal conveyer belt which generates micron size
conductive particles is used.  This invention solves such a problem.

      The system comprises a rotating brush made of nylon and an
evacuation fan unit.  The brush contacts the belt to sweep up the
particles and contaminants.  The particles are then carried away by
the evacuation fan.  The combined use of a conventional ultra sonic
cleaning and the brush cleaning substantially reduce particle
adhesion to the wafers.