Browse Prior Art Database

System for Producing High Hydrogen Partial Pressures in Sputter Chambers

IP.com Disclosure Number: IPCOM000104903D
Original Publication Date: 1993-Jun-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 57K

Publishing Venue

IBM

Related People

Meyer, D: AUTHOR

Abstract

To be highly chemically and mechanically resistant, diamond-like carbon layers - similar to those used as protective layers on thin-film magnetic disks - must have a high hydrogen content. In sputter systems, a high hydrogen content is normally only obtainable by high hydrogen partial pressures in the sputter atmosphere during layer deposition.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 64% of the total text.

System for Producing High Hydrogen Partial Pressures in Sputter Chambers

      To be highly chemically and mechanically resistant,
diamond-like carbon layers - similar to those used as protective
layers on thin-film magnetic disks - must have a high hydrogen
content.  In sputter systems, a high hydrogen content is normally
only obtainable by high hydrogen partial pressures in the sputter
atmosphere during layer deposition.

      In the inert part of the sputter atmosphere, the hydrogen
content is typically over 4%  which means that the entire system must
be explosion-proof.

      The described system increases the hydrogen partial pressure to
the sputter chamber, while components that are not continuously
evacuated are subjected to a non-explosive hydrogen content.  A
backing pump compresses only a non-explosive mixture against
atmospheric pressure.

      The operation of the system is such that hydrogen is separated
from a non-explosive mixture within an inert gas by utilizing the
diffusion of hydrogen through materials, such as palladium.  The
hydrogen thus separated flows into the sputter chamber at operating
pressure, whereas the inert gas is fed to the backing pump which
thins the operating atmosphere from a high-vacuum pump (and prevents
pump oil from flowing back).

      The illustrated system is designed as follows: A sputter
chamber 1 is evacuated or kept at operating pressure by a pump system
2.  A controlled gas supply 3 provides the...