Browse Prior Art Database

Diamond-like Carbon Coated Silicon Nozzle

IP.com Disclosure Number: IPCOM000104932D
Original Publication Date: 1993-Jun-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 30K

Publishing Venue

IBM

Related People

Brady, MJ: AUTHOR [+3]

Abstract

Disclosed is a method of protecting Ink Jet nozzles fabricated in single-crystal <100> silicon. The disclosed method allows for passivation of the silicon surface, providing a chemically inert and erosion-resistant coating. Using standard semiconductor processing, a single-crystal silicon substrate is processed to produce anisotropically etched nozzle(s). The nozzle or array of nozzles is then conformably coated with a diamond-like carbon (DLC) film utilizing a low temperature plasma-assisted chemical vapor deposition process.[*]

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Diamond-like Carbon Coated Silicon Nozzle

      Disclosed is a method of protecting Ink Jet nozzles fabricated
in single-crystal <100> silicon.  The disclosed method allows for
passivation of the silicon surface, providing a chemically inert and
erosion-resistant coating.  Using standard semiconductor processing,
a single-crystal silicon substrate is processed to produce
anisotropically etched nozzle(s).  The nozzle or array of nozzles is
then conformably coated with a diamond-like carbon (DLC) film
utilizing a low temperature plasma-assisted chemical vapor deposition
process.[*]

      The DLC coating, in addition to providing a passivation layer,
is also hard and scratch-resistant.  The disclosed method allows the
nozzles to be exposed to the high pH of the inks, allows for high
velocity of the ejected ink drops, thus extending the life time and
providing ink-drop placement accuracy, since the break-off point of
the ink jet remains constant.

Reference

[*]  A. Grill, B. Meyerson and V. Patel, "Diamond Like Carbon:
   Preparation, Properties and Applications", IBM Jour.  Res.  & Dev.
   34, 849 (1990).