Browse Prior Art Database

Pre-Silylation Resist Resolution Bake

IP.com Disclosure Number: IPCOM000105230D
Original Publication Date: 1993-Jun-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 1 page(s) / 25K

Publishing Venue

IBM

Related People

Denison, EV: AUTHOR [+2]

Abstract

A method for controlling resist swelling during silylation is disclosed. One method for grooving optical disks includes coating a substrate with resist, exposing the groove pattern and silylating the resist. The resolution of the silylated resist is critical to disk tracking performance. During the period between groove exposure and resist silylation, the resist emits solvents, thereby effecting resist resolution. The problem thus presented is how to control resist solvent emission prior to silylation.

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Pre-Silylation Resist Resolution Bake

      A method for controlling resist swelling during silylation is
disclosed.  One method for grooving optical disks includes coating a
substrate with resist, exposing the groove pattern and silylating the
resist.  The resolution of the silylated resist is critical to disk
tracking performance.  During the period between groove exposure and
resist silylation, the resist emits solvents, thereby effecting
resist resolution.  The problem thus presented is how to control
resist solvent emission prior to silylation.

      The aforementioned problem is solved by baking the resist after
exposure and before silylation.  The resist bake accelerates the
emission of solvents.  Relatively little solvent remains in the
resist after baking, thereby preventing uncontrolled swelling during
silylation.  Optical disk grooving resolution is thus no longer
sensitive to the time or condition between groove exposure and resist
silylation.

Disclosed Anonymously.